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Vacuum Coating Equipment Product List

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Advantages of Compact and Highly Expandable Modular Vacuum Deposition Equipment

Simple operability! Can be restructured into a completely different vacuum system in a short time and at low cost.

We would like to introduce our "Modular Vacuum Deposition System." In general vacuum systems, KF ports and CF ports are welded, and once the system is installed, the port configuration is fixed, making it impossible to change the chamber configuration. In the case of our product, all panels can be removed and replaced. Just like assembling blocks, it can be modified to various chamber configurations. 【Advantages (partial)】 ■ Compact design (can be installed on a laboratory bench) ■ Simple operability ■ Port configuration and number of ports can be changed ■ High expandability (addition of deposition sources and accessories) ■ Versatile use from simple coatings to multilayer films *For more details, please refer to the PDF document or feel free to contact us.

  • Vacuum Equipment
  • Vacuum Coating Equipment

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Roll-to-roll vacuum deposition system

A compact roll-to-roll film deposition device suitable for experimental research!

The "Roll-to-Roll Vacuum Deposition Device" is a machine capable of continuously forming thin films on a film substrate using a roll-to-roll method. It is a compact and economical device, making it suitable for research and development. By innovating the film transport system, high-speed film deposition becomes possible. Please feel free to contact us if you have any inquiries. 【Main Specifications】 ■Deposition Method: DC Magnetron Sputtering (RF compatible as an option) ■Substrate Transport: Roll-to-Roll (with tension control), speed 0.2~3.0m/min, tension 15~80N ■Roller Surface Length: 140mm ■Film Dimensions: Maximum width 100mm, length 100m (film thickness 50μm) *For more details, please download the PDF or contact us.

  • Vacuum Equipment
  • Vacuum forming machine
  • Vacuum Coating Equipment

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Vacuum film formation device (sputtering device, deposition device)

Large area sputtering is possible! Film deposition can be achieved even without cooling.

We would like to introduce our "Vacuum Deposition Equipment." Argon plasma is confined between two opposing targets, and the confined argon plasma ejects target material, which is deposited onto a substrate positioned at a 90-degree angle to the target. Additionally, by preserving the magnetic moment in a gradually changing magnetic field, the kinetic energy of the component parallel to the magnetic field plus the kinetic energy of the component perpendicular to the magnetic field remains constant, causing charged particles to be reflected at both ends of the magnetic poles. 【Features】 ■ Low-temperature deposition ■ High vacuum sputtering ■ Unique sputtering technology (composition control of the film, uniform plasma) ■ Proprietary magnetron cathode *For more details, please download the PDF or feel free to contact us.

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  • Sputtering Equipment
  • Vacuum Coating Equipment

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